About: http://webisa.webdatacommons.org/134713693

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The etch mask may comprise of a material commonly used for masking an etch process, such as photoresist, silicon oxide, silicon nitride, etc.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es