About: http://webisa.webdatacommons.org/134763889

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention relates to the fabrication of integrated circuit devices, and more particularly, to a semiconductor method of forming container cells, vias and other openings having a specifically desired etch profile.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com