About: http://webisa.webdatacommons.org/135040182

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	This invention relates to the control of physical vapor etching and depositing processes, and particularly of sputter etching or depositing of a material in the manufacture of semiconductor substrates by a sputtering cathode
http://www.w3.org/ns/prov#wasQuotedFrom	google.com