| http://www.w3.org/ns/prov#value | - The filling region is a region of a crystalline silicon film that fills an opening of a base insulating film that is formed under the crystalline silicon film. [0144] In FIGS. 31A to 31C, a silicon oxynitride film with a thickness of 100 nm is formed as a first insulating film 602 on a glass substrate 601.
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