About: http://webisa.webdatacommons.org/135842794

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	When depositing titanium in a contact hole 310 to silicide a contact, subsequent process steps comprise annealing, to form titanium silicide, and depositing a conductor such as aluminum, or tungsten, in the contact hole 310.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com