| http://www.w3.org/ns/prov#value | - Next, a heat treatment is performed by heating the substrate 11 formed with the resist columns 17 and the like at 120??? C. for 5 minutes, thereby forming the photosensitive resin layer 53, as shown in FIG. 17E. More specifically, the groups 12 of columnar portions composed of the plurality of columnar portions 13 a are provided in the region other than the portion formed with the TFT 51.
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