About: http://webisa.webdatacommons.org/137028935

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	In summary, the present invention is an apparatus and method for removing organic polymers, such as photoresist and surface contaminants, from the surface of an object, such as a semiconductor wafer.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com