About: http://webisa.webdatacommons.org/137342631

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	An etch stop layer 22 comprised of a material such as silicon nitride, silicon oxynitride, or silicon carbide is deposited by a CVD or PECVD technique on substrate 20 and on the first metal layer 21.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es