About: http://webisa.webdatacommons.org/138463139

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The invention is particularly useful for the fabrication of high-resolution resists, masks, and conductive paths that are essential to the production of integrated semiconductor devices.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com