About: http://webisa.webdatacommons.org/139172992

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Embodiments of the invention provide methods for preparing thin films used in a variety of applications, especially for high-k dielectric materials and barrier materials used in transistor, capacitor, and memory cell fabrication.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com