About: http://webisa.webdatacommons.org/139589920

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	st one semiconductor substrate in the chamber prior to the plasma cleaning step, the layers including at least one oxide film and the depositing stepcausing oxide residues to be deposited on interior surfaces of the chamber.13.
http://www.w3.org/ns/prov#wasQuotedFrom	patentgenius.com