| http://www.w3.org/ns/prov#value | - As in this embodiment, the amorphous silicon film is thicker in the area except the area over the metallic film (the thickness of the amorphous silicon film: 48 nm) than in the area over the metallic film (the gate electrode 11) (thickness: 30 nm), the maximum temperature of the surface of the film is substantially equal as described above and the overall film can be uniformly crystallized.
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