| http://www.w3.org/ns/prov#value | - A cleansing solution such as de-ionized (DI) water, methanol or isopropyl alcohol is used to rinse and remove the remaining HF solution. [0003] However, using this method poses a problem of leaving the cleansing solution in a gap of a micron unit between the microstructure and the substrate in the drying process for evaporating the cleansing solution.
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