PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • Suitable etching agents include acids such as sulfuric acid, ammonium hydroxide, and others. [0079]FIG. 18 shows a cross-sectional view of a portion of an integrated circuit substrate after forming an inlaid conductive electrolessly deposited layer over the interconnect line 156 of FIG. 17.
http://www.w3.org/ns/prov#wasQuotedFrom
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