| http://www.w3.org/ns/prov#value | - As shown in FIG. 26, it can be seen that the polycrystalline silicon film 58 formed by the crystallization of the first layer amorphous silicon film 53 is substantially flat and smooth (or in other words, has a constant film thickness along the side wall of the silicon oxide film 50), and that the granular silicon crystal 57 is formed in such a manner as to adhere to the surface of the flat polycr
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