About: http://webisa.webdatacommons.org/14384889

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention is a method and apparatus for controlling a semiconductor substrate fabrication process including an apparatus for obtaining in-situ data of a substrate in a semiconductor substrate processing chamber.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es