| http://www.w3.org/ns/prov#value | - 0012] In practice, when a holding means as claimed in the invention is being used for planarization and stabilization of the wafer by the forces which form as a result of the Bernoulli principle, first of all a pressurized gas, for example air or nitrogen, is routed with several times atmospheric pressure through a channel to at least one nozzle which discharges on the gripper surface.
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