About: http://webisa.webdatacommons.org/149434450

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	In the example where first masking material layer 140 is a photoresist, first masking material layer 140 may be suitably removed by various methods including an oxygen plasma etch, laser ablation, and wet chemical etching.
http://www.w3.org/ns/prov#wasQuotedFrom	google.fr