PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • In one embodiment, a planarization process such as chemically mechanical polishing (CMP) is performed, rendering inner electrode 166 co-planar with pad layer 110.
http://www.w3.org/ns/prov#wasQuotedFrom
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