About: http://webisa.webdatacommons.org/150861784

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Impurities (such as contaminants, metals, and the like) may, for example, be introduced at the oxide layer/semiconductor interface of MOS transistors during oxidation processing, plasma deposition, etching or other processing steps.
http://www.w3.org/ns/prov#wasQuotedFrom	freshpatents.com