About: http://webisa.webdatacommons.org/151009626

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	A thin film of Ta2O5 may be deposited using reactive sputtering, chemical vapor deposition (CVD), plasma-enhanced CVD (PECVD), or electron cyclotron resonance (ECR) processing and any other suitable process.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es