| http://www.w3.org/ns/prov#value | - After application of the photosensitive resin is completed, a photosensitive resin layer is formed as a resin base material 33 on the substrate by pre-baking the photosensitive resin liquid on the substrate for more than one minute at temperature in a range of 80??? C. to 100??? C., for example, using a heating device such as an oven and a hot plate.
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