About: http://webisa.webdatacommons.org/159301908

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The reactive sputtering gas used for depositing the metal oxide film may be an oxygen containing gas, such as pure oxygen, a mixture of oxygen and an inert gas, or an oxide gas, such as carbon dioxide.
http://www.w3.org/ns/prov#wasQuotedFrom	patents.com