| http://www.w3.org/ns/prov#value | - The second insulating film 70 may be formed of an inorganic material such as a silicon nitride or a silicon oxide, an organic material having photosensitivity and superior planarization characteristics, or a low-k insulating material formed by PECVD, such as a-Si:C:O or a-Si:O:F. The second insulating film 70 may be formed to a thickness of 1,500 through 3,000 ???.
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