| http://www.w3.org/ns/prov#value | - tentFiling datePublication dateApplicantTitleUS7786320May 12, 2009Aug 31, 2010Advanced Technology Materials, Inc.Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideUS7887883May 11, 2010Feb 15, 2011Advanced Technology Materials, Inc.Composition and method for low temperature dep
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