| http://www.w3.org/ns/prov#value | - the scatterometrytechnique, a method for processing a substrate such as a wafer, a substrate processing apparatus for realizing the method, and a substrate cooling processing unit.To achieve the above object, the present invention is a method for measuring a line width of a predetermined pattern formed in a resist film on a substrate, characterized by including the steps of: measuring a predeterm
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