| http://www.w3.org/ns/prov#value | - It will be appreciated by those skilled in the art that the thermophoretic pellicle disclosed here can also be used in many other lithographic operations, such as protection of a wafer during exposure, inspection, storage, and handling; protection of reticles during fabrication by such processes as sputtering of metallic and semiconducting layers, ion sputtering, thermal evaporation, or molecular
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