| http://www.w3.org/ns/prov#value | - At this time, a liquid repellent film is formed around the gate electrode to prevent the liquid material from contacting with the gate electrode whereby short-circuit between the gate electrode and the source region or the drainregion is prevented.First Example of the First EmbodimentFirst, the CVD method is used to deposit a semiconductor material such as silicone, or the like on the insulating s
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