| http://www.w3.org/ns/prov#value | - As suggested by FIG. 11, in an embodiment in which the shallow trench isolation structure 40 and the dielectric isolation layer 14 are both formed of the same material or are formed of substantially similar materials, such as silicon dioxide, these structures may form a combined structure in which the parts are essentially indistinguishable from each other, although they were formed by different p
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