About: http://webisa.webdatacommons.org/166488639

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The excess material 518, the multiple layer silicon nitride film 505, and the pad oxide layer 504 may be removed by any suitable process, such as chemical mechanical polishing (CMP), etching, and the like.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com