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http://webisa.webdatacommons.org/167212405
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http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value
Next, using a silicon nitride film (not shown) as a mask, steam oxidation is performed on the surface of the n-type epitaxial layer 2 and the LOCOS 3 is formed to a thickness of for example about 0.8 to 1.5 ??m.
http://www.w3.org/ns/prov#wasQuotedFrom
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