PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • In an embodiment of the present invention, the gate dielectric layer is a high-K dielectric such as, but not limited to, metal oxide dielectric such as tantalum oxide, titanium oxide, zirconium oxide, and hafnium oxide.
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