About: http://webisa.webdatacommons.org/172984648

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Subsequently an oxide such as silicon oxide is deposited on the wafer to form the shallow trench isolation regions 32 which are separated by oxide regions 70 a, 70 b (FIG. 13).
http://www.w3.org/ns/prov#wasQuotedFrom	google.com