| http://www.w3.org/ns/prov#value | - Then, a peripheral part is covered by an insulating film such as a silicon oxided film and the like, the film of the wiring 382 is formed after this part is made flat, and this time etching is carried out up to the very vicinity of lowest wirings 385 and 384 by means of a wiring pattern orthogonally crossing the above wiring pattern.
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