About: http://webisa.webdatacommons.org/17536680

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	present invention is a method of fabricating an integrated circuit which enables the placement of a second layer pattern on a first layer pattern with high accuracy that satisfies overlay requirements for advanced technologies.
http://www.w3.org/ns/prov#wasQuotedFrom	patentgenius.com