About: http://webisa.webdatacommons.org/175947703

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Subsequent to patterning hard mask layer 30, the patterned layer of photoresist may be removing by using a stripping process such as a wet etch or reactive ion etch stripping process.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com