About: http://webisa.webdatacommons.org/178485271

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	This embodiment is an embodiment in which the present invention is applied to a projection exposure apparatus of a stepper type having an alignment system of the LIA method wherein a light flux of multiple wavelengths is employed.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com