| http://www.w3.org/ns/prov#value | - As mentioned above in detail, according to the present invention, using the conventional spin coating apparatus and developing apparatus, an acid generated after exposing a chemically amplified resist which is able to expose to an excimer laser such as KrF (248 nm) and ArF (193 nm), an X-ray, an electron beam or the like can be prevented from being deactivated for a long time.
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