PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • Using the metal layer left behind as an etch mask, the pattern can be further transferred to the substrate 4 (FIG. 1(d)) by various etching methods, for example reactive ion etching (RIE).
http://www.w3.org/ns/prov#wasQuotedFrom
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