| http://www.w3.org/ns/prov#value | - Consequently, ions are accelerated by the negative direct current self bias voltage, and for example, the material of the antenna is not sputtered onto the inner wall of the plasma chamber 1 or the workpiece 6 to increase the lifespan of the high frequency plasma apparatus and to prevent the adverse effect of such sputtering on process such as etching or CVD.
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