| http://www.w3.org/ns/prov#value | - For example, in some embodiments of the present invention the aforementioned plasma treatment is accomplished using a standard oxide etch system, for example a LAM??? 4520 or the like (LAM is a registered trademark of LAM Research, Inc., Fremont, Calif.), while in some embodiments the plasma treatment is incorporated as a preliminary step of a monolithic metal etch process.
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