| http://www.w3.org/ns/prov#value | - A projection exposure method as claimed in claim 1, wherein a second imaging optics are disposed between the mask and the projection optics and further including inserting a second grating at a position that is approximately a conjugate of said first phase grating, and said second grating having a spatial pitch P2 in one direction described approximately as: P2=P1*Mc. 12.
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