About: http://webisa.webdatacommons.org/191979238

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	For removing these residual deposits, chamber cleaning chemistry may include a plasma such as a combination of argon and CF4, or argon and NF3, or argon and SF6.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com