About: http://webisa.webdatacommons.org/195335667

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The method as in claim 1, in which said mask pattern is formed on a reticle and said substrate is a semiconductor wafer having a photosensitive coating thereon, and
http://www.w3.org/ns/prov#wasQuotedFrom	google.com