| http://www.w3.org/ns/prov#value | - As shown in FIG. 1L, a layer 48 of electrically insulating material, such as silicon dioxide, phosphosilicate glass (PSG), undoped silicate glass (USG) or silicon nitride is disposed over second layer 26 of insulating material and electrically conductive segment 44, preferably by PECVD techniques to a thickness of approximately 7,500 angstroms.
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