| http://www.w3.org/ns/prov#value | - A silicon oxide film formed by CVD, a silicon oxide film applied by a SOG (Spin On Glass) method or spin coating, an organic insulating film such as acrylic or a non-photosensitive organic insulating film, each of which is from 0.7 ??m to 5.0 ??m thick, may be used for the second interlayer insulating film 312.
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