PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • Next, by low-pressure CVD, plasma CVD, sputtering, or other techniques, an intrinsic (I-type) amorphous silicon film 303 is deposited to a thickness of 25 to 100 nm, for example, to 50 nm.
http://www.w3.org/ns/prov#wasQuotedFrom
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