About: http://webisa.webdatacommons.org/205906523

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	A preferred aspect of the present invention is a method of manufacturing a chemical-mechanical polishing (CMP) pad utilizing a spinodal decomposition, a bimodal decomposition, or a solvent-non-solvent induced phase separation process.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com