| http://www.w3.org/ns/prov#value | - A preferable example of the cleaning conditions includes a flow rate for CF4 gas of 0.1 to 50 SLM, a flow rate for oxygen gas of 0.1 to 2.0 SLM, a frequency of the high-frequency power supply to cause plasma chemical reaction of 50 kHz to 13.56 MHz, and a power of 30 to 500 W. The cleaning conditions are not restricted to the above, and other conditions may also provide the effect of this inventio
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