| http://www.w3.org/ns/prov#value | - A process for forming a pattern which comprises(i) a step of coating a photoresist composition on a substrate, the photoresist composition comprising(a) a polymer having repeating units of the formula: ##STR22## wherein R1 is a hydrogen atom or a methyl group; R2 and R3 are independently a hydrogen atom, or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms provided that R2 and R3
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